A Three-Dimensional Integrated Micro Calorimetric Flow Sensor in CMOS MEMS Technology

Wei Xu; Bo Wang; Mingzheng Duan; Moaaz Ahmed; Amine Bermak; Yi Kuen Lee

doi:10.1109/LSENS.2019.2893151

A Three-Dimensional Integrated Micro Calorimetric Flow Sensor in CMOS MEMS Technology

Wei Xu^*, Bo Wang, Mingzheng Duan, Moaaz Ahmed, Amine Bermak, Yi Kuen Lee

^*Corresponding author for this work

CSE Information & Computing Technology

Research output: Contribution to journal › Article › peer-review

25 Citations (Scopus)

Abstract

This article presents a 3-D integrated molybdenum (Mo) thermoresistive microcalorimetric flow sensor in a 0.18-μm CMOS MEMS technology. The sensor consists of a MEMS structure which is fabricated inside a sealed microchannel and a constant temperature control circuit implemented on the CMOS wafer. The MEMS structure and the CMOS circuit are 3-D integrated at the wafer level. For the N₂ gas flow, the proposed flow sensor achieves a high sensitivity of 0.71 mV/(m/s) and a wide bidirectional detection ability of -26-26 m/s. Moreover, an equivalent circuit model is proposed in this article, which depicts the nonlinear output/overheated temperature (V_out/ΔT_h) sensor response to the input gas flow. This model would be an efficient tool for the design and optimization of high-performance system-on-chip calorimetric flow sensors.

Original language	English
Article number	8613869
Journal	IEEE Sensors Letters
Volume	3
Issue number	2
DOIs	https://doi.org/10.1109/LSENS.2019.2893151
Publication status	Published - Feb 2019

Keywords

3-D integration
CMOS MEMS
Sensor systems
calorimetric flow sensor
microchannel
thermoresistive

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10.1109/LSENS.2019.2893151

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title = "A Three-Dimensional Integrated Micro Calorimetric Flow Sensor in CMOS MEMS Technology",

abstract = "This article presents a 3-D integrated molybdenum (Mo) thermoresistive microcalorimetric flow sensor in a 0.18-μm CMOS MEMS technology. The sensor consists of a MEMS structure which is fabricated inside a sealed microchannel and a constant temperature control circuit implemented on the CMOS wafer. The MEMS structure and the CMOS circuit are 3-D integrated at the wafer level. For the N2 gas flow, the proposed flow sensor achieves a high sensitivity of 0.71 mV/(m/s) and a wide bidirectional detection ability of -26-26 m/s. Moreover, an equivalent circuit model is proposed in this article, which depicts the nonlinear output/overheated temperature (Vout/ΔTh) sensor response to the input gas flow. This model would be an efficient tool for the design and optimization of high-performance system-on-chip calorimetric flow sensors.",

keywords = "3-D integration, CMOS MEMS, Sensor systems, calorimetric flow sensor, microchannel, thermoresistive",

author = "Wei Xu and Bo Wang and Mingzheng Duan and Moaaz Ahmed and Amine Bermak and Lee, {Yi Kuen}",

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AU - Bermak, Amine

AU - Lee, Yi Kuen

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AB - This article presents a 3-D integrated molybdenum (Mo) thermoresistive microcalorimetric flow sensor in a 0.18-μm CMOS MEMS technology. The sensor consists of a MEMS structure which is fabricated inside a sealed microchannel and a constant temperature control circuit implemented on the CMOS wafer. The MEMS structure and the CMOS circuit are 3-D integrated at the wafer level. For the N2 gas flow, the proposed flow sensor achieves a high sensitivity of 0.71 mV/(m/s) and a wide bidirectional detection ability of -26-26 m/s. Moreover, an equivalent circuit model is proposed in this article, which depicts the nonlinear output/overheated temperature (Vout/ΔTh) sensor response to the input gas flow. This model would be an efficient tool for the design and optimization of high-performance system-on-chip calorimetric flow sensors.

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A Three-Dimensional Integrated Micro Calorimetric Flow Sensor in CMOS MEMS Technology

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Keywords

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