Controlled growth of Cu2O thin films by electrodeposition approach

Md Anower Hossain*, Rashad Al-Gaashani, Hicham Hamoudi, Mohammed J. Al Marri, Ibnelwaleed A. Hussein, Abdelhak Belaidi, Belabbes A. Merzougui, Fahhad H. Alharbi, Nouar Tabet

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

93 Citations (Scopus)

Abstract

Thin films of Cu2O comprised of wavelike surface characteristic of compact nanoparticles were synthesized using a facile and cost-effective electrodeposition approach. The distinct surface morphologies with well-aligned crystal orientation were obtained through the controlled electrodeposition parameters. The high resolution AFM combined with the peak force AFM images mapped the nanomechanical and chemical properties of the Cu2O nanostructured films. The structural, optical, and compositional analyses of the as-deposited thin films show bulk Cu2O material. The electrodeposition approach could proceed non-intermittently under ambient conditions, and provides a facile and economic way of depositing thin films of Cu2O with wavelike characteristics. The photoluminescence lifetime was found be very short in the range of 0.8–1.3 ns for Cu2O films. The Mott-Schottky measurement exhibited p-type conductivity and carrier density was found to be ~2×1018. The observed photoluminescence lifetimes, and carrier densities could help implementing the Cu2O films as an efficient hole-conducting, and photoelectrode materials in solar cells and water splitting devices.

Original languageEnglish
Pages (from-to)203-211
Number of pages9
JournalMaterials Science in Semiconductor Processing
Volume63
DOIs
Publication statusPublished - 1 Jun 2017

Keywords

  • Cuprous oxide
  • Electrodeposition
  • Fluorescence lifetime
  • Material compositional analysis
  • Mott-Schottky plot
  • Thin film

Fingerprint

Dive into the research topics of 'Controlled growth of Cu2O thin films by electrodeposition approach'. Together they form a unique fingerprint.

Cite this