Effect of Cu on the microstructure and electrical properties of Cu/ZnO thin films

K. Muhammed Shafi; R. Vinodkumar; R. Jolly Bose; V. N. Uvais; V. P. Mahadevan Pillai

doi:10.1016/j.jallcom.2012.10.032

Effect of Cu on the microstructure and electrical properties of Cu/ZnO thin films

K. Muhammed Shafi^*, R. Vinodkumar, R. Jolly Bose, V. N. Uvais, V. P. Mahadevan Pillai

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

22 Citations (Scopus)

Abstract

The effect of copper layer on the microstructural and electrical properties of copper (Cu)/zinc oxide (ZnO) thin film structure on glass substrate, prepared by radio frequency (RF) magnetron sputtering have been investigated. Cu/ZnO thin film structures possess good microstructural and electrical properties which are correlated with Cu thickness. The crystal structure, elemental analysis, surface topography and electrical properties of the films were systematically investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM) with an energy dispersive X-ray spectroscopy (EDS) setup, atomic force microscopy (AFM) and four point probe analysis, respectively. The result showed that Cu/ZnO films exhibit high crystallinity with a very sharp intense XRD peak corresponding to lattice reflection plane (0 0 2) of a hexagonal wurtzite structure. Cu/ZnO film with higher copper thickness shows uniform grains which are densely packed and have distinct grain boundary. Cu/ZnO film with optimum copper thickness showed the lowest resistivity of 1.53 × 10^-3 Ω-cm and sheet resistance of 5.06 × 10 ² ω/sq.

Original language	English
Pages (from-to)	243-248
Number of pages	6
Journal	Journal of Alloys and Compounds
Volume	551
DOIs	https://doi.org/10.1016/j.jallcom.2012.10.032
Publication status	Published - 25 Feb 2013
Externally published	Yes

Keywords

Cu/ZnO thin films
Electric properties
Magnetron sputtering
Microstructure

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10.1016/j.jallcom.2012.10.032

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title = "Effect of Cu on the microstructure and electrical properties of Cu/ZnO thin films",

abstract = "The effect of copper layer on the microstructural and electrical properties of copper (Cu)/zinc oxide (ZnO) thin film structure on glass substrate, prepared by radio frequency (RF) magnetron sputtering have been investigated. Cu/ZnO thin film structures possess good microstructural and electrical properties which are correlated with Cu thickness. The crystal structure, elemental analysis, surface topography and electrical properties of the films were systematically investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM) with an energy dispersive X-ray spectroscopy (EDS) setup, atomic force microscopy (AFM) and four point probe analysis, respectively. The result showed that Cu/ZnO films exhibit high crystallinity with a very sharp intense XRD peak corresponding to lattice reflection plane (0 0 2) of a hexagonal wurtzite structure. Cu/ZnO film with higher copper thickness shows uniform grains which are densely packed and have distinct grain boundary. Cu/ZnO film with optimum copper thickness showed the lowest resistivity of 1.53 × 10-3 Ω-cm and sheet resistance of 5.06 × 10 2 ω/sq.",

keywords = "Cu/ZnO thin films, Electric properties, Magnetron sputtering, Microstructure",

author = "{Muhammed Shafi}, K. and R. Vinodkumar and Bose, {R. Jolly} and Uvais, {V. N.} and {Mahadevan Pillai}, {V. P.}",

year = "2013",

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day = "25",

doi = "10.1016/j.jallcom.2012.10.032",

language = "English",

volume = "551",

pages = "243--248",

journal = "Journal of Alloys and Compounds",

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publisher = "Elsevier B.V.",

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T1 - Effect of Cu on the microstructure and electrical properties of Cu/ZnO thin films

AU - Muhammed Shafi, K.

AU - Vinodkumar, R.

AU - Bose, R. Jolly

AU - Uvais, V. N.

AU - Mahadevan Pillai, V. P.

PY - 2013/2/25

Y1 - 2013/2/25

N2 - The effect of copper layer on the microstructural and electrical properties of copper (Cu)/zinc oxide (ZnO) thin film structure on glass substrate, prepared by radio frequency (RF) magnetron sputtering have been investigated. Cu/ZnO thin film structures possess good microstructural and electrical properties which are correlated with Cu thickness. The crystal structure, elemental analysis, surface topography and electrical properties of the films were systematically investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM) with an energy dispersive X-ray spectroscopy (EDS) setup, atomic force microscopy (AFM) and four point probe analysis, respectively. The result showed that Cu/ZnO films exhibit high crystallinity with a very sharp intense XRD peak corresponding to lattice reflection plane (0 0 2) of a hexagonal wurtzite structure. Cu/ZnO film with higher copper thickness shows uniform grains which are densely packed and have distinct grain boundary. Cu/ZnO film with optimum copper thickness showed the lowest resistivity of 1.53 × 10-3 Ω-cm and sheet resistance of 5.06 × 10 2 ω/sq.

AB - The effect of copper layer on the microstructural and electrical properties of copper (Cu)/zinc oxide (ZnO) thin film structure on glass substrate, prepared by radio frequency (RF) magnetron sputtering have been investigated. Cu/ZnO thin film structures possess good microstructural and electrical properties which are correlated with Cu thickness. The crystal structure, elemental analysis, surface topography and electrical properties of the films were systematically investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM) with an energy dispersive X-ray spectroscopy (EDS) setup, atomic force microscopy (AFM) and four point probe analysis, respectively. The result showed that Cu/ZnO films exhibit high crystallinity with a very sharp intense XRD peak corresponding to lattice reflection plane (0 0 2) of a hexagonal wurtzite structure. Cu/ZnO film with higher copper thickness shows uniform grains which are densely packed and have distinct grain boundary. Cu/ZnO film with optimum copper thickness showed the lowest resistivity of 1.53 × 10-3 Ω-cm and sheet resistance of 5.06 × 10 2 ω/sq.

KW - Cu/ZnO thin films

KW - Electric properties

KW - Magnetron sputtering

KW - Microstructure

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DO - 10.1016/j.jallcom.2012.10.032

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SN - 0925-8388

VL - 551

SP - 243

EP - 248

JO - Journal of Alloys and Compounds

JF - Journal of Alloys and Compounds

ER -

Effect of Cu on the microstructure and electrical properties of Cu/ZnO thin films

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Keywords

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