Growth and characterization of CdTe:Ge:Yb

N. V. Sochinskii*, E. Saucedo, M. Abellan, J. Rodríguez-Fernández, P. Hidalgo, J. Piqueras, C. M. Ruiz, V. Bermúdez, E. Diéguez

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Cadmium telluride (CdTe) crystals and epitaxial layers were grown by the vertical Bridgman method and vapor-phase epitaxy, respectively, to obtain the high-resistive material suitable for X- and gamma-ray detectors. The crystals and layers were doped with Ge at the concentration of 5×1017 cm-3 and co-doped with the rare element Yb at the concentration range from 1×1017 to 1×1019 cm-3. The CdTe:Ge:Yb samples were studied by the structural and electrical characterization techniques, low-temperature photoluminescence (PL) and cathodoluminescence (CL) spectroscopy and CL imaging. Experimental findings testify that homogeneous crystals and layers of reasonably good structural quality can be grown with the Yb concentration below the value of 5×1018 cm-3 that is estimated to be the limit for Yb solubility in CdTe:Ge:Yb. These findings seem to be related with the purification effect caused by the interaction of the Yb dopant with the group I residual impurities.

Original languageEnglish
Pages (from-to)2076-2079
Number of pages4
JournalJournal of Crystal Growth
Volume310
Issue number7-9
DOIs
Publication statusPublished - Apr 2008
Externally publishedYes

Keywords

  • A2. Bridgman technique
  • A3. Vapor-phase epitaxy
  • B1. CdTe
  • B2. Semiconducting II-VI

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