TY - JOUR
T1 - Towards an optimum silicon heterojunction solar cell configuration for high temperature and high light intensity environment
AU - Abdallah, Amir
AU - El Daif, Ounsi
AU - Aïssa, Brahim
AU - Kivambe, Maulid
AU - Tabet, Nouar
AU - Seif, Johannes
AU - Haschke, Jan
AU - Cattin, Jean
AU - Boccard, Mathieu
AU - De Wolf, Stefaan
AU - Ballif, Christophe
N1 - Publisher Copyright:
© 2017 The Authors. Published by Elsevier Ltd.
PY - 2017
Y1 - 2017
N2 - We report on the performance of Silicon Heterojunction (SHJ) solar cell under high operating temperature and varying irradiance conditions typical to desert environment. In order to define the best solar cell configuration that resist high operating temperature conditions, two different intrinsic passivation layers were tested, namely, an intrinsic amorphous silicon a-SiOx:H with CO2/SiH4 ratio of 0.4 and a-SiOx:H with CO2/SiH4 ratio of 0.8, and the obtained performance were compared with those of a standard SHJ cell configuration having a-Si:H passivation layer. Our results showed how the short circuit current density Jsc, and fill factor FF temperature-dependency are impacted by the cell's configuration. While the short circuit current density Jsc for cells with a-SiOx:H layers was found to improve as compared with that of standard a-Si:H layer, introducing the intrinsic amorphous silicon oxide (a-SiOx:H) layer with CO2/SiH4 ratio of 0.8 has resulted in a reduction of the FF at room temperature due to hindering the carrier transport by the band structure. Besides, this FF was found to improve as the temperature increases from 15 to 45°C, thus, a positive FF temperature coefficient.
AB - We report on the performance of Silicon Heterojunction (SHJ) solar cell under high operating temperature and varying irradiance conditions typical to desert environment. In order to define the best solar cell configuration that resist high operating temperature conditions, two different intrinsic passivation layers were tested, namely, an intrinsic amorphous silicon a-SiOx:H with CO2/SiH4 ratio of 0.4 and a-SiOx:H with CO2/SiH4 ratio of 0.8, and the obtained performance were compared with those of a standard SHJ cell configuration having a-Si:H passivation layer. Our results showed how the short circuit current density Jsc, and fill factor FF temperature-dependency are impacted by the cell's configuration. While the short circuit current density Jsc for cells with a-SiOx:H layers was found to improve as compared with that of standard a-Si:H layer, introducing the intrinsic amorphous silicon oxide (a-SiOx:H) layer with CO2/SiH4 ratio of 0.8 has resulted in a reduction of the FF at room temperature due to hindering the carrier transport by the band structure. Besides, this FF was found to improve as the temperature increases from 15 to 45°C, thus, a positive FF temperature coefficient.
KW - Silicon heterojucntion
KW - current-voltage curve
KW - irradiance
KW - temeprature coefficient
UR - http://www.scopus.com/inward/record.url?scp=85031903179&partnerID=8YFLogxK
U2 - 10.1016/j.egypro.2017.09.307
DO - 10.1016/j.egypro.2017.09.307
M3 - Conference article
AN - SCOPUS:85031903179
SN - 1876-6102
VL - 124
SP - 331
EP - 337
JO - Energy Procedia
JF - Energy Procedia
T2 - 7th International Conference on Silicon Photovoltaics, SiliconPV 2017
Y2 - 3 April 2017 through 5 April 2017
ER -